• Porous Ceramic Vacuum Chuck for Wafer
  • Porous Ceramic Vacuum Chuck for Wafer

Porous Ceramic Vacuum Chuck


Porous Ceramic Vacuum Chuck for Wafer shows stable and uniformed adsorption, it is applicable to both magnetic and non-magnetic works due to its absorption method. And it is very important for porous ceramic to have high porosity and maintain high strength, especially in the area of semiconductor and display industry.

porous ceramic vacuum chuck

Porous Vacuum Chuck Description:

1, Material:

Porous ceramics with pore size 10-100um

2. Feature:

  • High flatness and parallelism, flatness reaches 0.005um
  • Uniform chucking force
  • Flexible design and fast delivery

3. Application:

  • Wafer Dicing / Grinding / Inspection
  • Thin Film Epitaxy
  • Microfabrication

Please kindly send inquiry of Porous Ceramic Vacuum Chuck to info@ceramic.vip or chinafineceramics@gmail.com. We will reply to you within 12 hours.

Our Materials:  



Silicon Carbide

Silicon Nitride

Boron Nitride


Your name (required)

Your Email (required)